| Exhibition name:SPIE photomask |
| Organiser:SPIE-The International Society for Optical Engineering |
| venue:Monterey Marriott and Monterey Conference Center |
| Detail: The Annual BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to present your research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication http://www.spie.org/photomask.xml |
Wednesday, 13 July 2011
SPIE photomask
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